Please use this identifier to cite or link to this item: https://idr.l1.nitk.ac.in/jspui/handle/123456789/11247
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dc.contributor.authorRao, G.K.
dc.contributor.authorBangera, K.V.
dc.contributor.authorShivakumar, G.K.
dc.date.accessioned2020-03-31T08:30:59Z-
dc.date.available2020-03-31T08:30:59Z-
dc.date.issued2013
dc.identifier.citationCurrent Applied Physics, 2013, Vol.13, 1, pp.298-301en_US
dc.identifier.urihttp://idr.nitk.ac.in/jspui/handle/123456789/11247-
dc.description.abstractThe paper reports the fabrication and detailed electrical characterization of thermal evaporated n-Si/p-ZnTe thin film heterojunction diodes. The heterojunction diodes were prepared by depositing ZnTe films on n-Si substrates. The conduction mechanism, barrier height, space charge density and width of the depletion region were determined by I-V and C-V characteristics of the heterojunction diodes. The bandgap and activation energies of n-Si and p-ZnTe were also determined and a theoretical band diagram of n-Si/p-ZnTe heterojunction was drawn based on Anderson's model. 2012 Elsevier B.V. All rights reserved.en_US
dc.titleFabrication and characterization of thermal evaporated n-Si/ p-ZnTe thin film heterojunction diodesen_US
dc.typeArticleen_US
Appears in Collections:1. Journal Articles

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