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dc.contributor.authorSinghal, R.-
dc.contributor.authorSatyanarayan, M.N.-
dc.contributor.authorPal, S.-
dc.date.accessioned2020-03-31T08:31:00Z-
dc.date.available2020-03-31T08:31:00Z-
dc.date.issued2012-
dc.identifier.citationOptik, 2012, Vol.123, 21, pp.1911-1914en_US
dc.identifier.urihttp://idr.nitk.ac.in/jspui/handle/123456789/11258-
dc.description.abstractSingle-mode small-core (?2 ?m 2 ?m) Y-branch waveguide structures in photosensitive polymer have been fabricated. Y-branch waveguides are designed by the beam propagation method and Y-branch waveguides are obtained on development after a cross-linkable negative tone epoxy SU-8 2002 polymer is exposed to UV through a photomask. Optical Adhesive NOA 61 is used as under- and over-clad. The fabrication process is optimized to avoid polymer residue at the Y-junction. The average insertion loss obtained for a 7.2 mm 1 2 device at chip-level is ?13 dB at 1550 nm. 2011 Elsevier GmbH.en_US
dc.titleFabrication of single-mode Y-branch waveguides in photosensitive polymer with reduced Y-junction residueen_US
dc.typeArticleen_US
Appears in Collections:1. Journal Articles

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