Please use this identifier to cite or link to this item: https://idr.l1.nitk.ac.in/jspui/handle/123456789/14964
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dc.contributor.authorJithin M.A.
dc.contributor.authorGanapathi K.L.
dc.contributor.authorUdayashankar N.K.
dc.contributor.authorMohan S.
dc.date.accessioned2021-05-05T10:16:05Z-
dc.date.available2021-05-05T10:16:05Z-
dc.date.issued2020
dc.identifier.citationIOP Conference Series: Materials Science and Engineering , Vol. 872 , 1 , p. -en_US
dc.identifier.urihttps://doi.org/10.1088/1757-899X/872/1/012113
dc.identifier.urihttp://idr.nitk.ac.in/jspui/handle/123456789/14964-
dc.description.abstractNiTi shape memory alloy (SMA) thin films were deposited onto silicon substrate using pulsed DC magnetron sputtering technique. To obtain crystalline NiTi thin films has to be synthesized at higher temperatures (475 - 525) C. This high temperature requirement restricts the ease in conventional lithographic procedures. The recent advancements in the laser micromachining lend their applications into the fabrication of miniaturized systems. The femtosecond lasers (FSL) allow non-thermal processing of materials by ablation. This work focuses on the deposition and fabrication of NiTi (≈1.5 μm. thick) and titanium nitride (TiN ≈0.3 μm. thick) thin films based miniaturized systems by femtosecond laser bulk micromachining. The NiTi and TiN microstructures were release by bottom silicon etch using reactive ion etching chlorine chemistry (RIE-Cl). © Published under licence by IOP Publishing Ltd.en_US
dc.titleNovel fabrication technique for NiTi and TiN micro-structures by femtosecond lasersen_US
dc.typeConference Paperen_US
Appears in Collections:2. Conference Papers

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