Please use this identifier to cite or link to this item:
https://idr.l1.nitk.ac.in/jspui/handle/123456789/7830Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Reddy, V.R. | |
| dc.contributor.author | Dixit, B. | |
| dc.contributor.author | Udaya, Bhat, K. | |
| dc.date.accessioned | 2020-03-30T10:02:53Z | - |
| dc.date.available | 2020-03-30T10:02:53Z | - |
| dc.date.issued | 2012 | |
| dc.identifier.citation | Materials Science Forum, 2012, Vol.710, , pp.671-676 | en_US |
| dc.identifier.uri | http://idr.nitk.ac.in/jspui/handle/123456789/7830 | - |
| dc.description.abstract | Electroless Ni-high P alloy is deposited on commercial aluminium. Parameters are set so that deposit will be crystalline in nature with a very high phosphorous content. Deposition time is the variable. It is observed that all the deposits have nodular morphology indicating nucleation and growth phenomena. The nodules become coarse with increase in the deposition time. The deposit changes from clear crystalline to nanocrystalline with increase in deposition time. Coatings with lower deposition times have porosity in it. � (2012) Trans Tech Publications. | en_US |
| dc.title | Effect of deposition time on the characteristics of high phosphorous nickel deposit, deposited using electroless route | en_US |
| dc.type | Book chapter | en_US |
| Appears in Collections: | 2. Conference Papers | |
Files in This Item:
There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.