Please use this identifier to cite or link to this item: https://idr.l1.nitk.ac.in/jspui/handle/123456789/16975
Title: METHOD AND COMPOSITION FOR FABRICATING A HIGH-K DIELECTRIC MATERIAL
Authors: National Institute of Technology Karnataka
Keywords: COMPOSITION;FABRICATING;HIGH-K DIELECTRIC MATERIAL
Issue Date: 28-May-2021
Publisher: Indian Patent Office, Chennai
Series/Report no.: 201941047909;
Description: Patent Published Date: 28.05.2021
URI: http://idr.nitk.ac.in/jspui/handle/123456789/16975
Appears in Collections:7. Patents Published

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